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Dou-dou Liang#, Binjie Chen#, Hai Jun Cho, and Hiromichi Ohta, “Thickness Optimization toward High-Performance Bottom-Gated Transparent Tin Dioxide Thin-Film Transistor”, ACS Appl. Electron. Mater. 2, 3454-3458 (2020).

2020.10.09/カテゴリ: 論文

Dou-dou Liang*#, Binjie Chen#, Hai Jun Cho, and Hiromichi Ohta*, “Thickness Optimization toward High-Performance Bottom-Gated Transparent Tin Dioxide Thin-Film Transistor”, ACS Appl. Electron. Mater. 2, 3454-3458 (2020).

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Dou-dou Liang#, Binjie Chen#, Hai Jun Cho, and Hiromichi Ohta, “Thickness Optimization toward High-Performance Bottom-Gated Transparent Tin Dioxide Thin-Film Transistor”, ACS Appl. Electron. Mater. 2, 3454-3458 (2020).