Tomoya Oshikiri, Hiroki Sawayanagi, Keisuke Nakamura, Kosei Ueno, Takayoshi Katase, Hiromichi Ohta, and Hiroaki Misawa*, “Arbitrary control of the diffusion potential between a plasmonic metal and a semiconductor by an angstrom-thick interface dipole layer”, J. Chem. Phys. 152, 934705 (2020)
Tomoya Oshikiri, Hiroki Sawayanagi, Keisuke Nakamura, Kosei Ueno, Takayoshi Katase, Hiromichi Ohta, and Hiroaki Misawa*, “Arbitrary control of the diffusion potential between a plasmonic metal and a semiconductor by an angstrom-thick interface dipole layer”, J. Chem. Phys. 152, 934705 (2020)
